Difference between revisions of "Investigation of the source starvation effect in III-V MOSFET"
From iis-projects
(Created page with "250px|thumb ==Short Description== To overcome the saturation of the electron velocity in next generation metal-oxide...") |
|||
Line 4: | Line 4: | ||
===Status: Available === | ===Status: Available === | ||
− | : Looking for 1 Semester/Master | + | : Looking for 1 Semester/Master student |
: Contact: [[:User:Mluisier | Mathieu Luisier]] | : Contact: [[:User:Mluisier | Mathieu Luisier]] | ||
===Prerequisites=== | ===Prerequisites=== |
Revision as of 15:47, 8 March 2014
Contents
Short Description
To overcome the saturation of the electron velocity in next generation metal-oxide-semiconductor field-effect transistors (MOSFETs), Silicon, the material of reference in the transistor industry, could be replaced by III-V semiconductors. InGaAs, for example, offers better electron transport properties than Si, but the number of available carriers that can rapidly flow through a transistor structure is limited due to the very low density-of-states of III-V semiconductors. As a consequence, the source contact of III-V MOSFETs might not be able to provide enough electrons at the time, thus leading to a reduction of the drive current instead of an increase. This phenomena is known as source starvation effect. The goal of this project is to develop a rate-equation model capable of capturing the distribution of the electron population in the source contact of III-V MOSFETs and of determining whether or not source starvation plays a significant role.
Status: Available
- Looking for 1 Semester/Master student
- Contact: Mathieu Luisier
Prerequisites
- Interest in device modeling
Character
- 30% Theory
- 40% Model Implementation
- 30% Simulations